Process Description
Thermal Oxidation
Chrome thin film

Chrome RF sputter deposition.

dep rate= 9.4nm/min, power=400W RF, pressure=10mT Argon, substrate height =120
Gold thin film Thin films of gold can be deposited via sputtering or evaporation. Ebeam and resistive thermal evaporation are available.
Aluminum thin film Thin films of aluminum can be deposited via sputtering or evaporation.
Titanium thin film Thin films of titanium can be deposited via sputtering.
Silicon Dioxide thin film Thin films of silicon dioxide can be deposited via sputtering.
Iron thin film Thin films of iron can be deposited via sputtering.
Permalloy thin film Thin films of permalloy can be deposited via sputtering.
Amod Evaporator Operation
Nickel E-beam Evaporation Nickel thin films can be deposited via electron beam evaporation using a vitreous carbon crucible liner in the Angstrom Amod Evaporator.
Aluminum Thin Film (Evaporation)

Aluminum thin films can be deposited via electron beam evaporation using a infiltrated carbon crucible liner in the Angstrom Amod Evaporator.
Deposition rates of up to 30A/s can be achieved.

Alumina Thin Film (Evaporation) Alumina thin films can be deposited via electron beam evaporation in the Angstrom Amod Evaporator.
Chrome Thin Film (Evaporation) Chrome thin films can be thermally evaporated in the Angstrom Amod Evaporator.
Silicon Dioxide Thin Film (Evaporation) Silicon Dioxide thin films can be deposited via electron beam evaporation in the Angstrom Amod Evaporator
Indium Tin Oxide (Evaporation) Indium Tin Oxide can be deposited via electron beam evaporation in the Angstrom Amod Evaporator.
Creating A Single-Layer Process and Parameters Explanation

Single-Layer Process Setup

  1. Click on the“Edit” tab of the menu selection and then click “Process.” The Process Edit dialog box will show the setup of the last process run.
  2. Click the “New” button in the dialog box. Add a name for the new process and click “Enter” to save the new name.
  3. Click the “Layer” tab to assure the layer parameters are displayed.
  4. Click the “Initial Rate” setting. This is the deposition speed and is measured in A/s. The “Final Thickness” can be adjusted to a thickness measured in kA. Note: 1kA=100nm