Oxidation Diffusion Wetbench
![Photo of Oxidation Diffusion Wetbench](/old-images/equipment/oxidation-diffusion-wetbench-400x300.jpg)
Description
Wet process station for RCA cleaning of silicon substrates prior to oxidation or diffusion.
Processes
RCA clean for oxidation/diffusion
- The oxidation/diffusion clean for silicon wafers consist of three chemical baths. SC1 for residual organics, SC2 for metal impurities and HF dip to remove any native oxide.