Filmetrics F3
Introduction to Reflectometry
Reflectometry is a method of metrology used to measure thin film thickness. Light is emitted from a source, transmitted through a thin film, and reflected back to a sensor. Based on the material and thickness of the film different wavelengths of light are transmitted with different intensities, due to the interference of light. This measurement is compared to a theoretical model to determine film thickness. Please read the article by Sigma Aldrich to learn more.
Equipment Manual
*Note that the instructions below may not contain the most recent updates. Please refer to the manuals printed and posted at the equipment.
*To avoid electrical shocks, do not use the system if there are missing panels and electrical equipment is exposed.
- Max substrate size: 1mm to 300mm+ in diameter
- Substrates must be clean and dry
- Do not place wet/dirty substrates on the F3.
1. Turn on/wake up this computer and login. Enter the username, “filmetrics”, and password “Operator1”.
a. You can also login to the computer using NetID and Password. If you opt for this option don’t forget to log out when you are done.
2. Check that the tool is on, and the built-in light source is on
3. If just using the built-in light source, let machine sit for 10 min after turning it on, if using deuterium lamp, let machine sit for 30 min after turning it on.
4. Open up Filmetrics software, “FILMeasure”, on the desktop of the computer if not already opened.
5. Select a recipe to use by selecting the small arrow button on the left side of the screen or edit a recipe by clicking the “Edit Recipe” button
a. Do not edit anything in the MMF Recipes except for the expected thickness
b. Feel free to save as any MMF recipe with a new name in a new folder
6. Take a baseline by pressing the “Baseline” button and follow the instructions.
a. First it will ask for a spectrum sample. Place your substrate underneath the light and click “Take Sample Reflectance”.
b. Next it will ask for a reflectance standard. To your left in a clear plastic box are various reflectance materials. Select the reflectance material based on your substrate and place the reflectance material underneath the light, making sure the notches in the reflectance material fall in-line with the grid of the base. Make sure the reference material selected on screen is the same as the reference material you use. Once properly aligned, click “Take Reflectance Standard”.
c. Next it will ask for a Background measurement. Remove the material standard and place it back in the clear plastic box. Make sure nothing is underneath the light and click “Take Background”.
7. Place your wafer underneath the light source. Using the live camera feature, move around your wafer to place the translucent dot on the spot where you want to measure the thickness.
8. Press “Measure” and the results will come up.
a. Check that the results are accurate by referring to the “Goodness of fit” in the Measurement Results box below the “Edit Recipe” button.
9. If you want to save your data, you can save wafer maps using standard Window commands.
- Warning – Low Signal Intensity
- Click “Reset”, then “OK” and take the reflectance standard again.
- Error after running a baseline
- Make sure you are using the sample and reference at the right time.
- Accept the error and try your sample. Most often, you will get this error when someone else has used a different material for the reference.
- The thickness is not close to the expected value, or the goodness of fit is too low.
- Check that the thickness you expect is within the range in the “Film Stack” tab in the recipe editor.
- Redo the baseline.
- Measurement Results window not visible.
- The window is most likely minimized.