Wetbenches
| Process | Description |
|---|---|
| RCA clean for oxidation/diffusion | The oxidation/diffusion clean for silicon wafers consist of three chemical baths. SC1 for residual organics, SC2 for metal impurities and HF dip to remove any native oxide. |
Facility Manager:
Dr. Andrew Lingley
Montana State University
518 Cobleigh Hall
Bozeman, MT 59717
Phone: (406) 994-2518
Email: andrew.lingley@montana.edu
Facility Director:
Dr. David Dickensheets
Montana State University
530 Cobleigh Hall
Bozeman, MT 59717
Phone: (406) 994-7874
Email: davidd@montana.edu
Student Offices:
111 Barnard Hall
Phone: (406) 994-3112