AZ 400T is an organic solvent based photoresist stripper. This stripper is optimized to remove organic etch residue as well as remaining photoresist after plasma processing.
AZ 400T datasheetProcess guide for resist removalFacility Manager:
Dr. Andrew Lingley
Montana State University
518 Cobleigh Hall
Bozeman, MT 59717
Phone: (406) 994-2518
Email: andrew.lingley@montana.edu
Facility Director:
Dr. David Dickensheets
Montana State University
530 Cobleigh Hall
Bozeman, MT 59717
Phone: (406) 994-7874
Email: davidd@montana.edu
Student Offices:
111 Barnard Hall
Phone: (406) 994-3112
