Anisotropic Silicon etch bath

A process for anisotropic bulk etching of silicon wafers is available at MMF. A dedicated temperature controlled bath with a cooled lid is located in the Base/Litho bench. This bath has 0.1C temperature control and features a coolant loop around the bath lid acting as a condenser, preventing loss of etchant thereby maintaining etchant concentration.

MMF stocks 25% by weight electronic grade TMAH in water.